RF - Magnetron Sputtering System
Overview
Toyama has built a number of sputtering systems ranging from research systems to industrial deposition tools. Two examples are shown on this page.
Typical Specification for research system
- RF Magnetron sputtering source
- Target size - 100mm diameter
- Matching box - auto tuning
- Water cooled system
- Auto pressure control (APC) system
- Sample heater
- Vacuum pressure - 10-7Pa